BEGIN:VCALENDAR
VERSION:2.0
PRODID:icalendar-ruby
CALSCALE:GREGORIAN
X-WR-CALNAME:EUV Resist Workshop
X-WR-TIMEZONE:Eastern Time (US & Canada)
BEGIN:VEVENT
DTSTAMP:20260615T110904Z
UID:tag:localist.com\,2008:EventInstance_53012930313175
DTSTART:20260715T200000Z
DTEND:20260716T000000Z
DESCRIPTION:Presented by the Center for EUV Resists and Materials\n\nJoin u
 s for this two-day workshop featuring top practitioners in creating\, char
 acterizing and using EUV photoresists who will share how to refine and upg
 rade the infrastructure for making advanced resists.\n\n \n\nSynopsis \n\n
 Extreme ultraviolet photoresists are a critical component in making advanc
 ed computer chips. How they interact with EUV light\, however\, remains a 
 mystery and critical technologies for characterizing the most advanced res
 ists are still scarce. \n \n\nPrimary Themes\n\nMechanisms of EUVInstrumen
 tation to characterize advanced resistsEUV applications \n\nExplore the Pr
 ogram - Discover the full schedule of events and find out who will be pres
 enting in each workshop session.\n\n \n\nImportant Dates\n\nRegistration D
 eadline: June 24Hotel Reservation Deadline: June 24\nRegister for the Work
 shop\n \n\nFind Lodging\n\nHampton Inn Albany - Western Ave/University Are
 a will provide a reduced rate for attendees registered for the workshop: $
 117 a night on July 15 or 16.\n \n\nAddress: 1442 Western Avenue\, Albany 
 NY 12203\nPhone: (518) 438-0001\nHampton Inn Albany\n\n \n\nOur Sponsors\n
 \n                  \n\n \n\nBecome a sponsor
GEO:42.692107;-73.831833
LOCATION:Albany Nanotech Complex
SUMMARY:EUV Resist Workshop
URL;VALUE=URI:https://events.albany.edu/event/2026-euv-resist-workshop
CATEGORIES:Conferences & Symposiums
CATEGORIES:Trainings & Workshops
END:VEVENT
BEGIN:VEVENT
DTSTAMP:20260615T110904Z
UID:tag:localist.com\,2008:EventInstance_53012930314200
DTSTART:20260716T120000Z
DTEND:20260716T210000Z
DESCRIPTION:Presented by the Center for EUV Resists and Materials\n\nJoin u
 s for this two-day workshop featuring top practitioners in creating\, char
 acterizing and using EUV photoresists who will share how to refine and upg
 rade the infrastructure for making advanced resists.\n\n \n\nSynopsis \n\n
 Extreme ultraviolet photoresists are a critical component in making advanc
 ed computer chips. How they interact with EUV light\, however\, remains a 
 mystery and critical technologies for characterizing the most advanced res
 ists are still scarce. \n \n\nPrimary Themes\n\nMechanisms of EUVInstrumen
 tation to characterize advanced resistsEUV applications \n\nExplore the Pr
 ogram - Discover the full schedule of events and find out who will be pres
 enting in each workshop session.\n\n \n\nImportant Dates\n\nRegistration D
 eadline: June 24Hotel Reservation Deadline: June 24\nRegister for the Work
 shop\n \n\nFind Lodging\n\nHampton Inn Albany - Western Ave/University Are
 a will provide a reduced rate for attendees registered for the workshop: $
 117 a night on July 15 or 16.\n \n\nAddress: 1442 Western Avenue\, Albany 
 NY 12203\nPhone: (518) 438-0001\nHampton Inn Albany\n\n \n\nOur Sponsors\n
 \n                  \n\n \n\nBecome a sponsor
GEO:42.692107;-73.831833
LOCATION:Albany Nanotech Complex
SUMMARY:EUV Resist Workshop
URL;VALUE=URI:https://events.albany.edu/event/2026-euv-resist-workshop
CATEGORIES:Conferences & Symposiums
CATEGORIES:Trainings & Workshops
END:VEVENT
END:VCALENDAR