Presented by the Center for EUV Resists and Materials

Join us for this two-day workshop featuring top practitioners in creating, characterizing and using EUV photoresists who will share how to refine and upgrade the infrastructure for making advanced resists.

Synopsis 

Extreme ultraviolet photoresists are a critical component in making advanced computer chips. How they interact with EUV light, however, remains a mystery and critical technologies for characterizing the most advanced resists are still scarce. 

Primary Themes

• Mechanisms of EUV
• Instrumentation to characterize advanced resists
• EUV applications

Explore the Program - Discover the full schedule of events and find out who will be presenting in each workshop session.

Important Dates

• Registration Deadline: June 24
• Hotel Reservation Deadline: June 24

Register for the Workshop

Find Lodging

Hampton Inn Albany - Western Ave/University Area will provide a reduced rate for attendees registered for the workshop: $117 a night on July 15 or 16.

1442 Western Avenue, Albany NY 12203
(518) 438-0001
Hampton Inn Albany
 

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